Keywords
- AlScN
- Dry Etching
- IBE
Partial etching of Aluminum Scandium Nitride by Ion Beam Etching for next generation of RF MEMS Filter Applications
- Terzic, T. (Speaker)
- Andrianov, N. (Speaker)
- De Pastina, A. (Speaker)
- Sarah Risquez (Speaker)
Activity: Talk or presentation › Oral presentation