Partial etching of Aluminum Scandium Nitride by Ion Beam Etching for next generation of RF MEMS Filter Applications
- Terzic, T. (Redner)
- Andrianov, N. (Redner)
- De Pastina, A. (Redner)
- Sarah Risquez (Redner)
Aktivität: Präsentation oder Vortrag › Vortrag