Infrared Perfect Absorbers Fabricated by Colloidal Mask Etching of Al-Al<inf>2</inf>O<inf>3</inf>-Al Trilayers

T.D. Dao, K. Chen, S. Ishii, A. Ohi, T. Nabatame, M. Kitajima, T. Nagao

Research output: Contribution to journal › Article › peer-review

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TY - JOUR

T1 - Infrared Perfect Absorbers Fabricated by Colloidal Mask Etching of Al-Al2O3-Al Trilayers

AU - Dao, T.D.

AU - Chen, K.

AU - Ishii, S.

AU - Ohi, A.

AU - Nabatame, T.

AU - Kitajima, M.

AU - Nagao, T.

PY - 2015

Y1 - 2015

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-84937064806&partnerID=MN8TOARS

U2 - 10.1021/acsphotonics.5b00195

DO - 10.1021/acsphotonics.5b00195

M3 - Artikel

SN - 2330-4022

JO - ACS Photonics

JF - ACS Photonics

ER -