@inproceedings{e78f31deb4d84c48bcaf94d3494677b9,
title = "Determination of stress in silicon wafers using Raman spectroscopy",
keywords = "Raman, stress, silicon, processing, spectroscopy",
author = "Biasio, {M. De} and L. Neumaier and N. Vollert and E. Geier and M. Roesner and Ch. Hirschl and M. Kraft",
year = "2015",
language = "English",
volume = "9482",
pages = "142 -- 147",
editor = "Druy, {Mark A.} and Crocombe, {Richard A.} and Bannon, {David P.}",
booktitle = "Next-Generation Spectroscopic Technologies VIII",
}