Aluminum nitride on insulator: Material and processing optimization for integrated photonic applications

Jasmin Spettel; Nikolai Andrianov; Florian Dubois; ‪Hernán Furci; Tommaso Cassese; Marco Liffredo; Luis Guillermo Villanueva; Niels Quack; Mohssen Moridi; Thang Duy Dao

Aluminum nitride on insulator: Material and processing optimization for integrated photonic applications

Jasmin Spettel, Nikolai Andrianov, Florian Dubois, ‪Hernán Furci, Tommaso Cassese, Marco Liffredo, Luis Guillermo Villanueva, Niels Quack, Mohssen Moridi, Thang Duy Dao

Publikation: Konferenzband/Beitrag in Buch/Bericht › Konferenzartikel

Abstract

Thin film aluminum nitride on insulator (AlNOI) has gained attention as a promising material platform for integrated photonic circuits (PICs) due to its ability to operate over a wide spectral range covering the ultra-violet to mid-infrared regions, while enabling a broad range of passive photonic functionalities. This study aims to optimize sputtered AlNOI films for PICs, with an emphasis on the spectroscopic ellipsometry study over a range from 0.19 μm to 25 μm. Furthermore, we discuss our approach for fabricating AlNOI PICs components, with a particular focus on optimizing the etching process to attain smooth sidewall waveguides.

Originalsprache	Englisch
Titel	EPJ Web of Conferences
Band	287
Publikationsstatus	Veröffentlicht - 2023

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https://www.epj-conferences.org/articles/epjconf/abs/2023/13/epjconf_eosam2023_01004/epjconf_eosam2023_01004.html

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Spettel, J., Andrianov, N., Dubois, F., Furci, H., Cassese, T., Liffredo, M., Villanueva, L. G., Quack, N., Moridi, M., & Dao, T. D. (2023). Aluminum nitride on insulator: Material and processing optimization for integrated photonic applications. in EPJ Web of Conferences (Band 287) https://www.epj-conferences.org/articles/epjconf/abs/2023/13/epjconf_eosam2023_01004/epjconf_eosam2023_01004.html

@inproceedings{49d93c3b0376458bb1aa8fa771212898,

title = "Aluminum nitride on insulator: Material and processing optimization for integrated photonic applications",

abstract = "Thin film aluminum nitride on insulator (AlNOI) has gained attention as a promising material platform for integrated photonic circuits (PICs) due to its ability to operate over a wide spectral range covering the ultra-violet to mid-infrared regions, while enabling a broad range of passive photonic functionalities. This study aims to optimize sputtered AlNOI films for PICs, with an emphasis on the spectroscopic ellipsometry study over a range from 0.19 μm to 25 μm. Furthermore, we discuss our approach for fabricating AlNOI PICs components, with a particular focus on optimizing the etching process to attain smooth sidewall waveguides.",

author = "Jasmin Spettel and Nikolai Andrianov and Florian Dubois and ‪Hern{\'a}n Furci and Tommaso Cassese and Marco Liffredo and Villanueva, {Luis Guillermo} and Niels Quack and Mohssen Moridi and Dao, {Thang Duy}",

year = "2023",

language = "English",

volume = "287",

booktitle = "EPJ Web of Conferences",

}

Spettel, J , Andrianov, N , Dubois, F, Furci, H, Cassese, T, Liffredo, M, Villanueva, LG, Quack, N, Moridi, M & Dao, TD 2023, Aluminum nitride on insulator: Material and processing optimization for integrated photonic applications. in EPJ Web of Conferences. Bd. 287. <https://www.epj-conferences.org/articles/epjconf/abs/2023/13/epjconf_eosam2023_01004/epjconf_eosam2023_01004.html>

TY - GEN

T1 - Aluminum nitride on insulator: Material and processing optimization for integrated photonic applications

AU - Spettel, Jasmin

AU - Andrianov, Nikolai

AU - Dubois, Florian

AU - Furci, ‪Hernán

AU - Cassese, Tommaso

AU - Liffredo, Marco

AU - Villanueva, Luis Guillermo

AU - Quack, Niels

AU - Moridi, Mohssen

AU - Dao, Thang Duy

PY - 2023

Y1 - 2023

N2 - Thin film aluminum nitride on insulator (AlNOI) has gained attention as a promising material platform for integrated photonic circuits (PICs) due to its ability to operate over a wide spectral range covering the ultra-violet to mid-infrared regions, while enabling a broad range of passive photonic functionalities. This study aims to optimize sputtered AlNOI films for PICs, with an emphasis on the spectroscopic ellipsometry study over a range from 0.19 μm to 25 μm. Furthermore, we discuss our approach for fabricating AlNOI PICs components, with a particular focus on optimizing the etching process to attain smooth sidewall waveguides.

AB - Thin film aluminum nitride on insulator (AlNOI) has gained attention as a promising material platform for integrated photonic circuits (PICs) due to its ability to operate over a wide spectral range covering the ultra-violet to mid-infrared regions, while enabling a broad range of passive photonic functionalities. This study aims to optimize sputtered AlNOI films for PICs, with an emphasis on the spectroscopic ellipsometry study over a range from 0.19 μm to 25 μm. Furthermore, we discuss our approach for fabricating AlNOI PICs components, with a particular focus on optimizing the etching process to attain smooth sidewall waveguides.

M3 - Conference Paper

VL - 287

BT - EPJ Web of Conferences

ER -

Aluminum nitride on insulator: Material and processing optimization for integrated photonic applications

Abstract

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