Fine-tuning the etch depth profile via dynamic shielding of ion beam

Lixiang Wu; K. Q. Qiu; S. J. Fu

doi:10.1016/j.nimb.2016.05.021

Fine-tuning the etch depth profile via dynamic shielding of ion beam

Lixiang Wu, K. Q. Qiu, S. J. Fu

Research output: Contribution to journal › Article › peer-review

Original language	English
Journal	Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms
DOIs	https://doi.org/10.1016/j.nimb.2016.05.021
Publication status	Published - 2016
Externally published	Yes

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10.1016/j.nimb.2016.05.021

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TY - JOUR

T1 - Fine-tuning the etch depth profile via dynamic shielding of ion beam

AU - Wu, Lixiang

AU - Qiu, K. Q.

AU - Fu, S. J.

PY - 2016

Y1 - 2016

UR - http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000380082700012&KeyUID=WOS:000380082700012

U2 - 10.1016/j.nimb.2016.05.021

DO - 10.1016/j.nimb.2016.05.021

M3 - Article

JO - Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms

JF - Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms

ER -

Fine-tuning the etch depth profile via dynamic shielding of ion beam

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