Device Mismatching and Random Telegraph Signal In Digital Pixel Imagers On 90-nm CMOS Process

C. Rizk, P. Julian, A. Pasciaroni, H. Radhakrishnan, J. Wilson, P. Pouliquen

Research output: Conference proceeding/Chapter in Book/Report/Conference Paperpeer-review

Abstract

The interest and need for more digital processing and functionality in the readout circuits continue to grow rapidly while the pixel pitch is getting smaller and this trend continues from visible to long wave IR. For a fully digital design (i.e. A/D in the pixel), the digital circuit can consume a large portion of the available space depending on the process feature size, effective well capacity (absolute dynamic range), and in-pixel functionality. The upside is that the digital circuit scales with the process node. The down side is limiting available space for the analog (front end) portion of the pixel limiting the designs to CMOS processes with smaller feature size. As we previously reported on 55- and 65-nm designs, this paper shows results from two imagers fabricated on the 90-nm process. In addition to Random Telegraph Signal/Noise (RTS/N), this paper compares non-uniformity between the two designs with device mismatching being the main culprit.
Original languageEnglish
Title of host publication2020 Argentine Conference on Electronics (CAE)
PublisherIEEE Computer Society
Pages27-30
Number of pages4
ISBN (Print)978-1-7281-6196-9
DOIs
Publication statusPublished - 28 Feb 2020
Externally publishedYes
Event2020 Argentine Conference on Electronics (CAE) - Buenos Aires, Argentina
Duration: 27 Feb 202028 Feb 2020

Publication series

Name2020 Argentine Conference on Electronics, CAE 2020

Conference

Conference2020 Argentine Conference on Electronics (CAE)
Period27/02/2028/02/20

Keywords

  • FRIS
  • RTN
  • RTS
  • device mismatch
  • digital pixel
  • digital readout
  • infrared readout
  • nonuniformity
  • random telegraph signal noise
  • sigma delta

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