Algorithms for finely adjusting etch depths to improve the diffraction efficiency uniformity of large-aperture BSG

Lixiang Wu; K. Q. Qiu; Y. Liu; S. J. Fu

doi:10.1088/2040-8978/17/3/035401

Algorithms for finely adjusting etch depths to improve the diffraction efficiency uniformity of large-aperture BSG

Lixiang Wu, K. Q. Qiu, Y. Liu, S. J. Fu

Research output: Contribution to journal › Article › peer-review

Original language	English
Journal	Journal of Optics
DOIs	https://doi.org/10.1088/2040-8978/17/3/035401
Publication status	Published - 2015
Externally published	Yes

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TY - JOUR

T1 - Algorithms for finely adjusting etch depths to improve the diffraction efficiency uniformity of large-aperture BSG

AU - Wu, Lixiang

AU - Qiu, K. Q.

AU - Liu, Y.

AU - Fu, S. J.

PY - 2015

Y1 - 2015

UR - http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000350339100012&KeyUID=WOS:000350339100012

U2 - 10.1088/2040-8978/17/3/035401

DO - 10.1088/2040-8978/17/3/035401

M3 - Article

JO - Journal of Optics

JF - Journal of Optics

ER -

Algorithms for finely adjusting etch depths to improve the diffraction efficiency uniformity of large-aperture BSG

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