Dr. Jeremy Streque

Suchergebnisse

• 2022

  Wide-spectral range DUV – MIR spectroscopic ellipsometry study of PECVD-grown silicon oxide and nitride thinfims: Wide-spectral range DUV – MIR spectroscopic ellipsometry study of PECVD-grown silicon oxide and nitride thinfims

  Azeem, S. M., Spettel, J., Nikolai, A., Streque, J., Cassese, T., Pilz, J., Solonenko, D., Fleury, C., Dubois, F., Zhai, Y., Cselyuszka, N., Tortschanoff, A., Moridi, M. & Dao, T. D., 2022.

  Publikation: Konferenzbeitrag › Poster › Begutachtung

  • silicon oxides 100%
  • ellipsometry 92%
  • silicon nitrides 92%
  • nitrides 88%
  • vapor deposition 72%